68556
Fluka
Tetramethylammonium hydroxide solution
TraceSELECT®, 25% in H2O
| CAS Number: | 75-59-2 |
| Linear Formula: | (CH3)4N(OH) |
| Molecular Weight: | 91.15 |
| Beilstein Registry Number: | 3558708 |
| MDL number: | MFCD00008280 |
Description
| Legal Information | TraceSELECT is a registered trademark of Sigma-Aldrich Biotechnology LP and Sigma-Aldrich Co. |
Properties
| grade | TraceSELECT® |
| concentration | 25% in H2O |
| total impurities | ≤10 μg/kg total-iodine |
| refractive index | n |
| density | 1.020 g/mL at 20 °C |
| anion traces | bromide (Br-): ≤50 μg/kg |
| chloride (Cl-): ≤50 μg/kg | |
| fluoride (F-): ≤50 μg/kg | |
| nitrate (NO3-): ≤250 μg/kg | |
| phosphate (PO4-): ≤50 μg/kg | |
| sulfate (SO42-): ≤500 μg/kg | |
| cation traces | Ag: ≤0.5 μg/kg |
| Al: ≤5 μg/kg | |
| As: ≤1 μg/kg | |
| Au: ≤1 μg/kg | |
| Ba: ≤0.5 μg/kg | |
| Be: ≤0.5 μg/kg | |
| Bi: ≤0.5 μg/kg | |
| Ca: ≤10 μg/kg | |
| Cd: ≤0.5 μg/kg | |
| Ce: ≤0.5 μg/kg | |
| Co: ≤0.5 μg/kg | |
| Cr: ≤1 μg/kg | |
| Cs: ≤0.5 μg/kg | |
| Cu: ≤0.5 μg/kg | |
| Fe: ≤5 μg/kg | |
| Ga: ≤0.5 μg/kg | |
| Ge: ≤0.5 μg/kg | |
| Hg: ≤1 μg/kg | |
| In: ≤0.5 μg/kg | |
| K: ≤10 μg/kg | |
| Li: ≤0.5 μg/kg | |
| Mg: ≤0.5 μg/kg | |
| Mn: ≤0.5 μg/kg | |
| Mo: ≤0.5 μg/kg | |
| Na: ≤10 μg/kg | |
| Ni: ≤1 μg/kg | |
| Pb: ≤1 μg/kg | |
| Pt: ≤0.5 μg/kg | |
| Rb: ≤0.5 μg/kg | |
| Sb: ≤0.5 μg/kg | |
| Se: ≤1 μg/kg | |
| Sn: ≤0.5 μg/kg | |
| Sr: ≤0.5 μg/kg | |
| Ti: ≤1 μg/kg | |
| Tl: ≤0.5 μg/kg | |
| V: ≤1 μg/kg | |
| Zn: ≤1 μg/kg | |
| Zr: ≤1 μg/kg |
Safety
| Personal Protective Equipment | Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter |
| Hazard Codes | C |
| Risk Statements | 21/22-34 |
| Safety Statements | 26-36/37/39-45 |
| RIDADR | UN1835 8/PG 3 |
| WGK Germany | 1 |
References
| reference | Y.C. Sun et al., Combining electrothermal vaporization inductively coupled plasma mass spectrometry with in situ TMAH thermochemolysis for the direct determination of trace impurities in a polymer-based photoresist J. Anal. At. Spectrom. 21, 311-316, (2006) |
| Merck | Merck 13,9297 |
| Beilstein | Beil. 4,IV,145 |
| Fieser | Fieser 11,514 |
| FT-IR 2 (1), 604:C / RegBook 1 (1), 407:G / Sax 6, 2542 / Structure Index 1, 59:A:2 |
